• Title of article

    In situ interface characterization of silicon surface in fluoride media

  • Author/Authors

    Patel، نويسنده , , B.K. and Sahu، نويسنده , , S.N.، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2001
  • Pages
    4
  • From page
    914
  • To page
    917
  • Abstract
    The porous Si/HF-electrolyte junction has been studied by capacitance (C)–voltage (V) and current (I)–voltage (V) measurements. The observed current under forward bias shows an exponential increase like a Schottky diode with two oscillations around 1.0 and 2.4 V (SCE), respectively, whereas the reverse bias current shows negligible contribution. The low-frequency capacitance spectrum exhibits a peak structure in forward bias regime, which can be ascribed to the charge trapping/detrapping at Fermi level of porous Si under forward bias. The potential and charge distribution for a p-semiconductor/electrolyte junction is discussed
  • Keywords
    Silicon interface , Interface characterization , Fluoride media
  • Journal title
    MATERIALS SCIENCE & ENGINEERING: A
  • Serial Year
    2001
  • Journal title
    MATERIALS SCIENCE & ENGINEERING: A
  • Record number

    2136909