Title of article
Porogen concentration and its desorbing temperature dependence in porous silica film incorporated with ethylene groups
Author/Authors
Uchida، نويسنده , , Yasutaka and Ito، نويسنده , , Yoshito and Ishida، نويسنده , , Koichi، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2005
Pages
3
From page
250
To page
252
Abstract
Porogen concentration and its desorbing temperature dependence in porous silica film incorporated with ethylene groups were investigated. The peak of pore size distribution evaluated by using N2 gas adsorption was about 1 nm, and this value did not depend on the porogen concentration. The porogen desorbed from the film below 450 °C, and the lowest desorbing temperature was 375 °C.
Keywords
Porogen , Pore size distribution , Film density , low-k , Ethylene groups
Journal title
MATERIALS SCIENCE & ENGINEERING: B
Serial Year
2005
Journal title
MATERIALS SCIENCE & ENGINEERING: B
Record number
2142596
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