• Title of article

    Influence of the annealing conditions on the properties of InP thin films

  • Author/Authors

    ?zta?، نويسنده , , M. and Bedir، نويسنده , , M. and Kayal?، نويسنده , , Kevin R. and Aksoy، نويسنده , , F.، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2006
  • Pages
    6
  • From page
    94
  • To page
    99
  • Abstract
    InP thin films were prepared on glass substrates by the spray pyrolysis technique. Results on structural, optical and electrical properties of the layers as a function of the thermal annealing are reported. XRD data indicates that samples show microstructural perfection improvement as a function of annealing time. The optical band-gap shows a dependence with the inverse of the squared crystallite size, suggesting that electron confinement has some effect. The lattice parameter and band-gap energy (BGE) of the samples annealed at 450 °C for 160 min (20–40–80–120–160–200) correspond to the reported values of InP thin films. In addition, the electrical resistivity measurement shows a slight decrease when annealing time is increased up to 80 min but it saturates annealing times between 80 and 160 min. Then it is slightly increased for larger times.
  • Keywords
    InP , Thin film , Annealing , Structural properties , Spray pyrolysis
  • Journal title
    MATERIALS SCIENCE & ENGINEERING: B
  • Serial Year
    2006
  • Journal title
    MATERIALS SCIENCE & ENGINEERING: B
  • Record number

    2144257