Fabrication of amorphous silicon nanocones by bias-enhanced microwave plasma CVD

We present a simple growth of highly aligned silicon nanocones by using bias-enhanced microwave plasma CVD of gas mixture of hydrogen and methane. SiO2 and nickel films were used as a silicon precursor and a seeding material for patterning cone structure, respectively. SEM studies showed that the nanocones have nanometer-size tips and sub micrometer-size bases. TEM analysis revealed that the nanocones have amorphous structure with nickel on the tips. The model for formation of silicon nanostructures will also be suggested.