• Title of article

    Co-precipitation of copper and nickel in crystalline silicon

  • Author/Authors

    Rudolf، نويسنده , , C. and Saring، نويسنده , , P. and Stolze، نويسنده , , L. and Seibt، نويسنده , , M.، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2009
  • Pages
    4
  • From page
    365
  • To page
    368
  • Abstract
    Co-precipitation of copper and nickel in silicon bicrystals produced by wafer-bonding has been investigated. Transmission electron microscopy and energy-dispersive X-ray analysis show two types of precipitates: copper-rich silicide particles that contain a small partial mole fraction of 5% of nickel and nickel-rich particles containing a partial mole fraction between 15% and 25% of copper. Both types of precipitates are found inside large precipitate colonies typical for copper precipitation in silicon in the absence of nickel co-doping. Thermodynamically these precipitates can be assigned to the known binary metal silicide phases Cu3Si and NiSi2 and a solid solution of a second metal species therein.
  • Keywords
    Silicon , Transmission electron microscopy , Metal silicide precipitates , Metal impurities , Ternary phase diagram
  • Journal title
    MATERIALS SCIENCE & ENGINEERING: B
  • Serial Year
    2009
  • Journal title
    MATERIALS SCIENCE & ENGINEERING: B
  • Record number

    2146564