Title of article
An indentation method to measure the CRSS of semiconducting materials at elevated temperature
Author/Authors
Rivière، نويسنده , , J.P. and Largeau، نويسنده , , L. and Patriarche، نويسنده , , G. and Le Bourhis، نويسنده , , E.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2005
Pages
5
From page
451
To page
455
Abstract
An indentation method that allows to determine the critical resolved shear stress (CRSS) of semiconductors as a function of temperature is described. Specimens have to be thinned in such a way, that plastic flow throughout the thickness is generated. Assuming mechanical equilibrium allows to extract the CRSS from the plastic-zone perimeter evolution with changing load. At elevated temperature, we have estimated the thermal gradient in the specimens between the diamond tip and the heating stage and its influence on the local mechanical properties. The map of the temperature around the indent site allows to define an average CRSS of the material which is successfully compared with our experimental results.
Keywords
plasticity , Indentation , Semiconductors
Journal title
MATERIALS SCIENCE & ENGINEERING: A
Serial Year
2005
Journal title
MATERIALS SCIENCE & ENGINEERING: A
Record number
2147270
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