Title of article
Influence of substrate temperature on the materials properties of reactive DC magnetron sputtered Ti/TiN multilayered thin films
Author/Authors
Subramanian، نويسنده , , B. and Ananthakumar، نويسنده , , R. and Vidhya، نويسنده , , V.S. and Jayachandran، نويسنده , , M.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2011
Pages
7
From page
1
To page
7
Abstract
Ti/TiN multilayers were deposited by DC reactive magnetron sputtering method using a titanium target and an Ar–N2 mixture discharge gas. XRD technique was employed to study the structure of the coatings and to observe the variations of structural parameters with substrate temperatures. An increase in grain size with increase of substrate temperature was observed. The components of Ti 2p doublet, related to TiN, TiON and TiO2, were observed in the core-level spectra of the deposited multilayer films from XPS analysis. A microhardness value of 25.5 GPa was observed for Ti/TiN multilayers prepared at 400 °C. Electrical properties were found to depend on substrate temperature.
Keywords
Thin films , sputtering , Multilayers , Hard Coatings
Journal title
MATERIALS SCIENCE & ENGINEERING: B
Serial Year
2011
Journal title
MATERIALS SCIENCE & ENGINEERING: B
Record number
2148338
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