Title of article
Pulsed laser deposition of hydroxyapatite thin films under Ar atmosphere
Author/Authors
Bao، نويسنده , , Quanhe and Chen، نويسنده , , Chuanzhong and Wang، نويسنده , , Diangang and Lei، نويسنده , , Tingquan and Liu، نويسنده , , Junming، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2006
Pages
5
From page
25
To page
29
Abstract
This study was aimed at the pulsed laser deposition of hydroxyapatite (HA) thin films onto Ti substrate using KrF excimer laser. The deposition was carried out under an atmosphere of Ar at 45 Pa. The films structures have been analyzed by EPMA, TEM, XRD and Raman spectroscopy. It can be observed that the films are mainly composed of droplet-like particles which size of 0.2–2 μm. The results of XRD, TEM and Raman spectroscopy show that the films are amorphous. The ratio of Ca/P is 1.97, which is higher than that of HA. After heat treatment the XRD pattern show that the films were consist of HA and TiO2. The ratio of Ca/P is 1.82, which is close to that of crystalline HA.
Keywords
Laser deposition , Ar atmosphere , Hydroxyapatite , Thin films
Journal title
MATERIALS SCIENCE & ENGINEERING: A
Serial Year
2006
Journal title
MATERIALS SCIENCE & ENGINEERING: A
Record number
2149986
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