Title of article
Effects of aluminium doping on zinc oxide transparent thin films grown by filtered vacuum arc deposition
Author/Authors
Gontijo، نويسنده , , L.C. and Machado، نويسنده , , N. R. do Nascimento، نويسنده , , V.P.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2012
Pages
5
From page
780
To page
784
Abstract
Thin n-type ZnO films doped with different atomic concentrations of aluminium were grown by filtered vacuum arc deposition (FVAD) on glass substrates. The films were deposited using an oxygen working pressure of 2.0 mTorr with an arc current running at two 100 ms pulses s−1. Structural, optical and electrical properties were investigated to understand the effect of Al doping on ZnO films. The best values were found for an ideal aluminium percentage between 4 and 6 at.%.
Keywords
Transparent conductive oxide , Thin films , Vacuum arc deposition
Journal title
MATERIALS SCIENCE & ENGINEERING: B
Serial Year
2012
Journal title
MATERIALS SCIENCE & ENGINEERING: B
Record number
2150334
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