Title of article
Optical and structural properties of porous zinc oxide fabricated via electrochemical etching method
Author/Authors
Ching، نويسنده , , C.G and Lee، نويسنده , , S.C. and Ooi، نويسنده , , P.K. and Ng، نويسنده , , S.S. and Hassan، نويسنده , , Z. and Hassan، نويسنده , , H. Abu and Abdullah، نويسنده , , M.J.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2013
Pages
4
From page
956
To page
959
Abstract
We investigated the optical and structural properties of porous zinc oxide (ZnO) thin film fabricated by ultraviolet light-assisted electrochemical etching. This fabrication process used 10 wt% potassium hydroxide solution as an electrolyte. Hillock-like porous ZnO films were successfully fabricated according to the field emission scanning electron microscopy results. The cross-sectional study of the sample indicated that anisotropic-dominated etching process occurred. However, the atomic force microscopic results showed an increase in surface roughness of the sample after electrochemical etching. A resonance hump induced by the porous structure was observed in the infrared reflectance spectrum. Using theoretical modeling technique, ZnO porosification was verified, and the porosity of the sample was determined.
Keywords
metal oxide , Porous , Infrared reflectance
Journal title
MATERIALS SCIENCE & ENGINEERING: B
Serial Year
2013
Journal title
MATERIALS SCIENCE & ENGINEERING: B
Record number
2150877
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