Title of article
Identification of the first nucleated phase in submonolayer Ti deposited on Si(1 1 1)-7×7 by atomic resolution techniques
Author/Authors
Hsu، نويسنده , , H.F and Hsu، نويسنده , , H.C and Chiang، نويسنده , , T.F. and Chen، نويسنده , , L.J and Hsiao، نويسنده , , H.L، نويسنده ,
Issue Information
دوماهنامه با شماره پیاپی سال 2004
Pages
5
From page
347
To page
351
Abstract
Ti5Si4 has been identified to be the first nucleated phase in submonolayer Ti deposited on the Si(1 1 1)-7×7 surface by ultrahigh vacuum scanning tunneling microscopy in conjunction with atomic-resolution transmission electron microscopy. The direct observation of the formation of clusters surrounded by the heavily damaged silicon lattice strongly suggested that Si is the dominant diffusing species in forming the silicide.
Keywords
Submonolayer , 1)7×7 , 1 , Ti/Si(1 , First nucleated phase
Journal title
Ultramicroscopy
Serial Year
2004
Journal title
Ultramicroscopy
Record number
2156209
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