• Title of article

    Exploring different inelastic projection mechanisms for electron tomography

  • Author/Authors

    Goris، نويسنده , , B. and Bals، نويسنده , , S. and Van den Broek، نويسنده , , W. and Verbeeck، نويسنده , , J. and Van Tendeloo، نويسنده , , G.، نويسنده ,

  • Issue Information
    دوماهنامه با شماره پیاپی سال 2011
  • Pages
    6
  • From page
    1262
  • To page
    1267
  • Abstract
    Several different projection mechanisms that all make use of inelastically scattered electrons are used for electron tomography. The advantages and the disadvantages of these methods are compared to HAADF–STEM tomography, which is considered as the standard electron tomography technique in materials science. The different inelastic setups used are energy filtered transmission electron microscopy (EFTEM), thickness mapping based on the log-ratio method and bulk plasmon mapping. We present a comparison that can be used to select the best inelastic signal for tomography, depending on different parameters such as the beam stability and nature of the sample. The appropriate signal will obviously also depend on the exact information which is requested.
  • Keywords
    Electron tomography , Plasmon map , Thickness map , EFTEM
  • Journal title
    Ultramicroscopy
  • Serial Year
    2011
  • Journal title
    Ultramicroscopy
  • Record number

    2158356