Title of article
Low-frequency losses in silica glass at low temperature
Author/Authors
Travasso، نويسنده , , F. and Bosi، نويسنده , , L. and Dari، نويسنده , , A. and Gammaitoni، نويسنده , , L. and Vocca، نويسنده , , H. and Marchesoni، نويسنده , , F.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2009
Pages
4
From page
268
To page
271
Abstract
Precise low-frequency internal friction measurements on vitreous silica, taken over a wide temperature ( 4 K < T < 300 K) and frequency range (40 Hz < ν < 14 kHz), show remarkable similarities, but also suggestive differences with recent light-scattering experiments. In the interval 30 K < T < 110 K, the exponent α ( T ) of the power-law relaxational spectrum at low frequencies turns out to be proportional to T − T k , with a minimum at around T k = 13 K. This phenomenon is interpreted as a manifestation of quenched spatial disorder.
Keywords
Silica glass , Glass relaxation , Asymmetric double-well model , Internal friction
Journal title
MATERIALS SCIENCE & ENGINEERING: A
Serial Year
2009
Journal title
MATERIALS SCIENCE & ENGINEERING: A
Record number
2160193
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