Title of article
A novel method of fabricating porous silicon
Author/Authors
Chakravarty، نويسنده , , Dibyendu and Sarada، نويسنده , , B.V. and Chandrasekhar، نويسنده , , S.B. and Saravanan، نويسنده , , K. and Rao، نويسنده , , T.N.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2011
Pages
4
From page
7831
To page
7834
Abstract
Porous silicon was fabricated using the spark plasma sintering technique. High porosity ∼10–50% and strength ∼50–60 MPa was obtained by tailoring the SPS variables. XRD and Raman investigations showed presence of pure silicon and exhibition of photoluminescence under visible light at wavelength ∼520 nm confirmed the presence of porous silicon.
Keywords
X-ray diffraction , Sintering , grain growth , Powder metallurgy , Porous materials
Journal title
MATERIALS SCIENCE & ENGINEERING: A
Serial Year
2011
Journal title
MATERIALS SCIENCE & ENGINEERING: A
Record number
2164871
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