Title of article
An application of a new type deposition method to nuclear target preparation
Author/Authors
Sugai، نويسنده , , Isao، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 1997
Pages
10
From page
81
To page
90
Abstract
We have developed a new deposition method, which is based on the vibrational motion of microparticles in the electrostatic field between parallel electrodes. This method is straight forward and does not require any complicated mechanism. It has been found that this deposition technique is useful for the preparation of foils, in both the backed and unbacked condition. The first test results are reported.
Keywords
osmium , Thickness by charged particle reactions , Tungsten , Uniformity of target , Substrate temperature , Chromium , Beryllium , Focussed sputtering , Efficiency of evaporation , Manganese , Molybdenum , nickel , PALLADIUM , Powder target , Purity of target , boron
Journal title
Nuclear Instruments and Methods in Physics Research Section A
Serial Year
1997
Journal title
Nuclear Instruments and Methods in Physics Research Section A
Record number
2176473
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