Title of article
Cleaning of contaminated XUV-optics at BESSY II
Author/Authors
Eggenstein، نويسنده , , F and Senf، نويسنده , , F and Zeschke، نويسنده , , T and Gudat، نويسنده , , W، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2001
Pages
4
From page
325
To page
328
Abstract
Carbon contaminations as observed on XUV-optics can be removed by an in situ plasma discharge process. The method developed at BESSY is based on waterfree oxygen/argon mixture and avoids water contamination of the UHV-equipment.
dio frequency based plasma cleaning method has been used at several undulator beamlines at BESSY II with a gain in flux at the carbon K-edge. At the UE56-I-plane grating monochromator, a gain in flux up to a factor 20 is observed. No loss in flux has been observed across the whole energy ranges of the “cleaned” beamlines.
Keywords
Synchrotron radiation , Plasma discharge , Carbon contamination
Journal title
Nuclear Instruments and Methods in Physics Research Section A
Serial Year
2001
Journal title
Nuclear Instruments and Methods in Physics Research Section A
Record number
2191784
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