Title of article
Photoluminescence properties of ZnTe homoepitaxial films deposited by synchrotron-radiation-excited growth
Author/Authors
Nishio، نويسنده , , Mitsuhiro and Hayashida، نويسنده , , Kazuki and Harada، نويسنده , , Hiroki and Mitsuishi، نويسنده , , Yoshiaki and Guo، نويسنده , , Qixin and Ogawa، نويسنده , , Hiroshi، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2001
Pages
4
From page
1225
To page
1228
Abstract
ZnTe homoepitaxial films have been deposited at substrate temperatures between 27°C and 100°C by synchrotron-radiation-excited growth using diethylzinc and diethyltelluride. Effects of diethylzinc transport rate and substrate temperature upon the photoluminescence properties of the ZnTe films have been clarified. Strong deep level emissions centered at 1.85 and 2.1 eV related to defects such as vacancy-impurity complex become emerged with increasing diethylzinc transport rate or substrate temperature. A sharply excitonic emission at 2.375 eV associated with shallow acceptors is observed and neither a donor–acceptor pair recombination nor a deep level luminescence signal is detected in the spectrum of the film grown under the nearly stoichiometric condition, which indicates that ZnTe films of good quality can be grown even at room temperature by this growth technique.
Keywords
Photoluminescence property , ZnTe , Homoepitaxy , Synchrotron-radiation-excited growth , Low temperature growth
Journal title
Nuclear Instruments and Methods in Physics Research Section A
Serial Year
2001
Journal title
Nuclear Instruments and Methods in Physics Research Section A
Record number
2192243
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