Title of article
Heat load problems in deep X-ray lithography
Author/Authors
Cudin، نويسنده , , I. and De Bona، نويسنده , , F. and Gambitta، نويسنده , , A. and Pérennès، نويسنده , , F. and Turchet، نويسنده , , A.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2001
Pages
4
From page
1265
To page
1268
Abstract
A 3D mathematical model of a complete Deep X-Ray Lithography scanning unit based on the Finite Element Method (FEM) was developed to analyse the replication errors induced by the thermoelastic deformations occurring under irradiation. Different thermal and mechanical constraint conditions were considered in order to evaluate the maximum displacements of the irradiated mask area. The obtained results show that, to evaluate the replication errors, the support ring and its mechanical fittings have to be carefully considered in the model. It is observed that the absolute position error and the blur error and the error induced by the thermal expansion of the mask are both position dependent.
Keywords
X-ray mask , Thermoelasticity , Transient analysis , Deep X-Ray lithography , FEM
Journal title
Nuclear Instruments and Methods in Physics Research Section A
Serial Year
2001
Journal title
Nuclear Instruments and Methods in Physics Research Section A
Record number
2192253
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