• Title of article

    Fabrication of back-illuminated, fully depleted charge-coupled devices

  • Author/Authors

    Holland، نويسنده , , S.E and Dawson، نويسنده , , K.S. and Palaio، نويسنده , , N.P. and Saha، نويسنده , , J. and Roe، نويسنده , , N.A. and Wang، نويسنده , , G.، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2007
  • Pages
    5
  • From page
    653
  • To page
    657
  • Abstract
    We describe a fabrication strategy to produce fully depleted, back-illuminated charge-coupled devices (CCDs). Wafers are partially processed at a commercial foundry using standard processing techniques. The wafers are then thinned to the final desired thickness, and the processing steps necessary to produce back-illuminated devices are performed in our laboratory. The CCDs are then probed at wafer level, and we describe our techniques to screen for gate insulator flaws as well as defects on the back side of the wafer that are important for fully depleted devices.
  • Keywords
    High-resistivity silicon , Fabrication techniques , Back illuminated , Charge-coupled device , Fully depleted
  • Journal title
    Nuclear Instruments and Methods in Physics Research Section A
  • Serial Year
    2007
  • Journal title
    Nuclear Instruments and Methods in Physics Research Section A
  • Record number

    2207111