Title of article
Manufacturing of XEUV mirrors with a sub-nanometer surface shape accuracy
Author/Authors
Chkhalo، نويسنده , , N.I. and Kluenkov، نويسنده , , E.B. and Pestov، نويسنده , , A.E. and Polkovnikov، نويسنده , , V.N. and Raskin، نويسنده , , D.G. and Salashchenko، نويسنده , , N.N. and Suslov، نويسنده , , L.A. and Toropov، نويسنده , , M.N.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2009
Pages
4
From page
62
To page
65
Abstract
In this paper, first results of finishing EUV mirror substrate surface shape to given parameters using correction methods such as vacuum thin films deposition and local ion-beam etching through the mask are presented. For spherical mirror substrate with radius of curvature R=260 mm and a diameter of 130 mm, obtained values of PV=4.7 nm and RMS=0.6 nm.
Keywords
EUV lithography , Roughness , Multilayer mirrors , Ion etching
Journal title
Nuclear Instruments and Methods in Physics Research Section A
Serial Year
2009
Journal title
Nuclear Instruments and Methods in Physics Research Section A
Record number
2211077
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