Title of article
Chemical characterization of SiCxNy nanolayers by FTIR-and Raman spectroscopy, XPS and TXRF-NEXAFS
Author/Authors
Baake، نويسنده , , O. and Fainer، نويسنده , , N.I. and Hoffmann، نويسنده , , P. and Kosinova، نويسنده , , M.L. and Rumyantsev، نويسنده , , Yu.M. and Trunova، نويسنده , , V.A. and Klein، نويسنده , , A. and Ensinger، نويسنده , , W. and Pollakowski، نويسنده , , B. and Beckhoff، نويسنده , , B. and Ulm، نويسنده , , G.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2009
Pages
4
From page
174
To page
177
Abstract
SiCxNy nanolayers were synthesized by a remote plasma enhanced chemical vapour deposition (RPECVD) method and chemically characterized by Fourier transform infrared spectroscopy (FTIR), Raman spectroscopy, X-ray photoelectron spectroscopy (XPS), and near-edge X-ray absorption fine structure investigations in total reflection X-ray fluorescence geometry (TXRF-NEXAFS). The results are compared with those obtained for standard samples SiC and Si3N4 (and with spectra from the literature). As a first result, two or more compounds containing Si–N bonds (not Si3N4), one compound with a Si–C bond (not SiC), and graphitic carbon were identified.
Keywords
TXRF-NEXAFS , Silicon carbonitride , Chemical bonding , Thin film
Journal title
Nuclear Instruments and Methods in Physics Research Section A
Serial Year
2009
Journal title
Nuclear Instruments and Methods in Physics Research Section A
Record number
2211109
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