Title of article
Photothermal Investigation of Ti-Cu-N and Ti-Ni-N PVD Films
Author/Authors
G. and Prekel، نويسنده , , H. and Klopfstein، نويسنده , , M.J. and Giesselbach، نويسنده , , M. and Patzelt، نويسنده , , S. and Ghisleni، نويسنده , , R. and Lucca، نويسنده , , D.A. and Goch، نويسنده , , G. and Stock، نويسنده , , H.-R.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2006
Pages
4
From page
585
To page
588
Abstract
Thin titanium based PVD films on steel substrates are promising material combinations for high quality moulding tools required for the manufacturing of complex optical components. The chemical film composition and PVD process parameters determine the thermal and mechanical layer properties, which must remain stable at high temperatures during the moulding process. This paper describes the investigation of thermal and mechanical film properties with respect to film composition and thermal treatment at temperatures typical for moulding processes.
Keywords
Physical vapour deposition (PVD) , Coating , photothermal radiometry
Journal title
CIRP Annals - Manufacturing Technology
Serial Year
2006
Journal title
CIRP Annals - Manufacturing Technology
Record number
2267599
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