Title of article
Submicron imprint of trench structures by external and intrinsic electromagnetic force
Author/Authors
Hocheng، نويسنده , , H. and Wen، نويسنده , , T.T.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2010
Pages
4
From page
263
To page
266
Abstract
This paper describes a novel method for replication of submicron trench features by intrinsic electromagnetic imprinting force derived from the material made by mixing nanosize ferrite powders into ultraviolet-curable polymer, leading to the advantages of good uniformity and reduced structural deformation compared to mechanical nanoimprint methods. The features are fabricated to 0.5 μm wide and 0.2 μm high under the ultraviolet curing of 480 mJ/cm2, imprinting cycle time of 30 s and pressure as low as 0.92 kgf/cm2. The imprinting technique possesses the potential for fabrication of submicron magnetic features at room temperature across large area with high production rate and good pattern fidelity.
Keywords
Nano manufacturing , Submicron imprint , Miniaturization
Journal title
CIRP Annals - Manufacturing Technology
Serial Year
2010
Journal title
CIRP Annals - Manufacturing Technology
Record number
2268938
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