• Title of article

    Submicron imprint of trench structures by external and intrinsic electromagnetic force

  • Author/Authors

    Hocheng، نويسنده , , H. and Wen، نويسنده , , T.T.، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2010
  • Pages
    4
  • From page
    263
  • To page
    266
  • Abstract
    This paper describes a novel method for replication of submicron trench features by intrinsic electromagnetic imprinting force derived from the material made by mixing nanosize ferrite powders into ultraviolet-curable polymer, leading to the advantages of good uniformity and reduced structural deformation compared to mechanical nanoimprint methods. The features are fabricated to 0.5 μm wide and 0.2 μm high under the ultraviolet curing of 480 mJ/cm2, imprinting cycle time of 30 s and pressure as low as 0.92 kgf/cm2. The imprinting technique possesses the potential for fabrication of submicron magnetic features at room temperature across large area with high production rate and good pattern fidelity.
  • Keywords
    Nano manufacturing , Submicron imprint , Miniaturization
  • Journal title
    CIRP Annals - Manufacturing Technology
  • Serial Year
    2010
  • Journal title
    CIRP Annals - Manufacturing Technology
  • Record number

    2268938