Title of article
Influence of O2 and N2 Concentrations on the Characteristics of Plasma in DC Cylindrical Magnetron Discharge by Langmuir Probe
Author/Authors
Yasserian, Kiomars Department of Physics - Karaj Branch, Islamic Azad University, Karaj , Karimi, Zahra Department of Physics - Karaj Branch, Islamic Azad University, Karaj
Pages
9
From page
35
To page
43
Abstract
Using the Langmuir probe method, the reactive plasma parameters were studied in different ratios of oxygen and nitrogen concentrations in a DC cylindrical discharge device.The plasma parameters such as plasma potential, electron density and electron temperature wereextracted from the current-voltage characteristic’s curve of Langmuir probe to find the optimum conditions for deposit the oxynitride thin films.Chromium thin films were exposed to various O2/N2 partial pressures to obtain optimum valuefor produce of oxynitride chrome thin films. In addition, the influence of the magnetic field on the structural properties of the chrome oxynitride thin films was obtained. It is observed that for equal percentage of reactive gases, the optimum condition of the plasma discharge takes place in which the crystalline phases of oxynitride chrome thin films appear.
Keywords
Plasma discharge , Langmuir probe , Magnetron sputtering , oxynitride thin films , plasma parameters
Serial Year
2017
Record number
2494962
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