Title of article
Fabrication of Graphene Oxide Thin Films on Transparent Substrate via a Low-Voltage Electrodeposion Technique
Author/Authors
Abadi, Z. materials and energy research center (merc) - Department of Nanotechnology and Advanced Materials, كرج, ايران , Sangpour, P. materials and energy research center (merc) - Department of Nanotechnology and Advanced Materials, كرج, ايران , Tajabadi, F. materials and energy research center (merc) - Department of Nanotechnology and Advanced Materials, كرج, ايران
From page
6
To page
10
Abstract
Graphene oxide (GO) thin films were simply deposited on fluorine doped tin oxide (FTO) substrate via a low-voltage electrodeposition. The GO and GO thin films were characterized by Zeta Potential, Xray diffraction, Ultraviolet-Visible spectroscopy, atomic force microscopy, Fourier transform infrared spectroscopy, field emission scanning electron microscopy and energy dispersive X-ray spectroscopy. The results confirm existence of multi-layered graphene oxide. UV-vis spectra exhibit GO thin films possess 60-80% transmittance in the visible region. Calculating calculating optical band gap from UVvis spectra either for GO solution and GO thin film suggests a simultaneous reduction occurred during deposition.
Keywords
Graphene oxide , Graphene Oxide thin film , Electrodeposition , GO optical band gap
Journal title
Advanced Ceramics Progress
Journal title
Advanced Ceramics Progress
Record number
2530763
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