Title of article
Ultrathin Silica Films with a Nanoporous Monolayer
Author/Authors
Tanaka، Shunsuke نويسنده , , Nishiyama، Norikazu نويسنده , , Hayashi، Yasushi نويسنده , , Egashira، Yasuyuki نويسنده , , Ueyama، Korekazu نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2004
Pages
-1407
From page
1408
To page
0
Abstract
Ultrathin silica films with a monolayer of uniform nanopores were fabricated on a silicon substrate by contacting triblock copolymer films with tetraethoxysilane vapor followed by calcination to remove the copolymer.
Keywords
prediction , Power requirement , Surface finish , grinding , Application-production research , Genetic-fuzzy system
Journal title
CHEMISTRY LETTERS
Serial Year
2004
Journal title
CHEMISTRY LETTERS
Record number
28859
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