Title of article
Surface dynamics on a high-temperature Si surface under a high-pressure reactive gas atmosphere studied by time-resolved UPS
Author/Authors
Yuji Takakuwa، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 1999
Pages
11
From page
211
To page
221
Keywords
Si gas-phase process , Surface dynamics , In situ observation , Si adatom , Gas source molecular beam epitaxy , Oxidation , Time-resolved ultraviolet photoelectron spectroscopy , Etching
Journal title
JOURNAL OF ELECTRON SPECTROSCOPY & RELATED PHENOMENA
Serial Year
1999
Journal title
JOURNAL OF ELECTRON SPECTROSCOPY & RELATED PHENOMENA
Record number
379257
Link To Document