Title of article
X-ray absorption and emission spectroscopy at the Hf L1 edge of hafnium-(silicon)-oxide ultra-thin films
Author/Authors
Yasushi Uehara، نويسنده , , Kazumasa Kawase، نويسنده , , Jun’ichi Tsuchimoto and Teruo Shibano، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2005
Pages
5
From page
75
To page
79
Keywords
X-ray fluorescence , XANES , Hafnium silicate , hafnium oxide , High-k gate dielectric layer
Journal title
JOURNAL OF ELECTRON SPECTROSCOPY & RELATED PHENOMENA
Serial Year
2005
Journal title
JOURNAL OF ELECTRON SPECTROSCOPY & RELATED PHENOMENA
Record number
380519
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