Effect of target properties on deposition of lithium nickel cobalt oxide thin-films using RF magnetron sputtering

Electrochemically active lithium nickel cobalt oxide thin-film has not been fabricated until now. To fabricate stoichiometric lithium nickel cobaltate films, a sputtering target of proper composition has been synthesized via a solid-state reaction. The films are deposited by RF magnetron sputtering at room temperature. As-deposited films show an amorphous structure. By varying the deposition conditions—such as the working pressures and deposition times—thin-films with different characteristics are produced. The relationship between physical characteristics and electrochemical properties is investigated. A crystallized thin-film prepared by an annealing method displays a good discharge capacity and cycle life.