Title of article
Thick tellurium electrodeposition on nickel-coated copper substrate for 124I production
Author/Authors
D. R. Shelton and A. M. Sadeghi ، نويسنده , , M. Dastan، نويسنده , , M.R. Ensaf، نويسنده , , A. Abaspour Tehrani، نويسنده , , C. Tenreiro، نويسنده , , M. Avila، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2008
Pages
6
From page
1281
To page
1286
Abstract
Tellurium electrodeposition on a nickel-coated copper substrate was investigated for production of iodine-124. The electrodeposition experiments were carried out by the alkali plating baths. The optimum conditions of the electrodeposition of tellurium were as follows: 6 g l−1 tellurium, pH=10, DC current density of ca. 8.55 mA cm−2 and room temperature.
Keywords
Thick electrodeposition , Tellurium target , 124I , Production , TeO2
Journal title
Applied Radiation and Isotopes
Serial Year
2008
Journal title
Applied Radiation and Isotopes
Record number
548531
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