Title of article
Influence of annealing temperature on nano-stracture of Ti-Oxide thin films
Author/Authors
Khojier، K نويسنده , , Savaloni، H نويسنده ,
Issue Information
فصلنامه با شماره پیاپی 0 سال 2009
Pages
5
From page
9
To page
13
Abstract
Titanium films of 37.6 nm thickness were deposited on stainless steel type 304, and they were post-annealed under
flow of oxygen at different temperatures. The structure of the films was analysed using RBS, XRD and AFM. The
results showed an initial reduction of the grain size and surface roughness at 473 K annealing temperature, but grain
size and surface roughness increased at higher temperatures. It is observed that the crystallographic structure of the
film goes through a sudden change at 943 K annealing temperature and three phases of titanium oxide (i.e., rutile,
anatase and brokite) are formed. The RBS spectra showed that oxygen density and penetration depth in the sample
increased with annealing temperature.
Journal title
Journal of Theoretical and Applied Physics
Serial Year
2009
Journal title
Journal of Theoretical and Applied Physics
Record number
690382
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