Growing of carbon nanowalls on glass substrate by HFCVD technique

This work concentrates on the growth of carbon nanowalls (CNWs) using hot filament chemical vapour depo- sition (HF-CVD) technique on a glass substrate coated with Al nanocatalyst. A combination of CH4/NH3/H2 and C2H2/NH3/H2 renders the growth of carbon nanostructures such as diamond nanocrystals, carbon nanowalls, and carbon nanotubes. Parameters affecting the growth of CNTs such as C2H2 flow ratio, deposition time, and tempera- ture are investigated. Low temperature plasma is applied for deposition of Al nanocatalyst on the glass substrate. Surface morphology of the substrate is observed by atomic force microscopy (AFM). Samples are characterized by scanning electron microscopy and Raman spectroscopy. One of important conclusions in this work is that the growth of diamond nanocrystals and CNTs depend on the hydrocarbon gas species in the fed gas and process para- meters, respectively. It is also determined that, an increase of the hydrocarbon gas flow rate from 10 sccm to 20 sccm causes the formation of the CNWs on the substrate.