Decomposition of halogenated methanes in oxygen-free gas mixtures by the use of a silent electric discharge

A silent electric discharge was applied to decompose halogenated methanes including CCl4, CHCl3, CFCl3, CF2Cl2 and CF3Cl, in argon-containing gas mixtures. The decompositions of the target compounds were studied in static reactors at a fixed electric field and room temperature. The reaction products were analyzed by FT-IR spectroscopy, gas chromatography and UV spectrophotometry. The results demonstrated, that the radical-type decomposition of chlorofluoromethanes led to products formed by realignment of the halogen atoms. The decomposition of CCl4 was faster than that of the cholorofluoromethanes, and produced perchloroethane and chlorine. CHCl3 exhibited the highest decomposition rate and produced a large variety of products.