Title of article
Particle charge distribution measurement in exhaust gases of plasma enhanced processing equipment
Author/Authors
B. R. Forsyth، نويسنده , , B. Y. H. Liu، نويسنده ,
Issue Information
ماهنامه با شماره پیاپی سال 1998
Pages
2
From page
901
To page
902
Keywords
Charge distribution , Aerosol particles , PECVD , Semiconductor Process Exhaust
Journal title
Journal of Aerosol Science
Serial Year
1998
Journal title
Journal of Aerosol Science
Record number
741759
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