Title of article
Influence of oxygen and post deposition annealing on the electrical properties of MnPc and MnPcCl Schottky barrier devices
Author/Authors
K. R. RAJESH، نويسنده , , C. S. MENON، نويسنده ,
Issue Information
دوهفته نامه با شماره پیاپی سال 2005
Pages
6
From page
1115
To page
1120
Abstract
Sandwich structures of manganese phthalocyanine (MnPc) and manganese phthalocyanine
chloride (MnPcCl) thin films using aluminium (Al) and gold (Au) electrodes have been
prepared by thermal evaporation. Device characteristics of Al/MnPc/Au and Al/MnPcCl/Au
are performed and found to show rectification properties. The electrical conductivity has
been measured both after exposure to oxygen for 20 days and after annealing at
temperature up to 473 K. Current density-voltage characteristics under forward bias
(aluminium electrode negative) are found to be due to ohmic conduction at lower voltage
regions. At higher voltage regions there is space charge limited conductivity (SCLC)
controlled by a discrete trapping level above the valance edge. The electrical parameters of
oxygen doped and annealed samples in the ohmic and SCLC region are determined. The
reverse bias curves are interpreted in terms of a transition from electrode-limited Schottky
emission to the bulk-limited the Poole-Frenkel effect. The Schottky barrier parameters of
oxygen doped and annealed structures of MnPc and MnPcCl are determined from the C2-V
characteristics. C 2005 Springer Science + Business Media, Inc.
Journal title
Journal of Materials Science
Serial Year
2005
Journal title
Journal of Materials Science
Record number
829591
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