• Title of article

    Influence of oxygen and post deposition annealing on the electrical properties of MnPc and MnPcCl Schottky barrier devices

  • Author/Authors

    K. R. RAJESH، نويسنده , , C. S. MENON، نويسنده ,

  • Issue Information
    دوهفته نامه با شماره پیاپی سال 2005
  • Pages
    6
  • From page
    1115
  • To page
    1120
  • Abstract
    Sandwich structures of manganese phthalocyanine (MnPc) and manganese phthalocyanine chloride (MnPcCl) thin films using aluminium (Al) and gold (Au) electrodes have been prepared by thermal evaporation. Device characteristics of Al/MnPc/Au and Al/MnPcCl/Au are performed and found to show rectification properties. The electrical conductivity has been measured both after exposure to oxygen for 20 days and after annealing at temperature up to 473 K. Current density-voltage characteristics under forward bias (aluminium electrode negative) are found to be due to ohmic conduction at lower voltage regions. At higher voltage regions there is space charge limited conductivity (SCLC) controlled by a discrete trapping level above the valance edge. The electrical parameters of oxygen doped and annealed samples in the ohmic and SCLC region are determined. The reverse bias curves are interpreted in terms of a transition from electrode-limited Schottky emission to the bulk-limited the Poole-Frenkel effect. The Schottky barrier parameters of oxygen doped and annealed structures of MnPc and MnPcCl are determined from the C2-V characteristics. C 2005 Springer Science + Business Media, Inc.
  • Journal title
    Journal of Materials Science
  • Serial Year
    2005
  • Journal title
    Journal of Materials Science
  • Record number

    829591