Title of article
Preparation of 6N high-purity indium by method of physical-chemical purification and electrorefining
Author/Authors
Zhi-Hua Zhou، نويسنده , , JIAN-MING RUAN، نويسنده , , HONG-BING MO، نويسنده ,
Issue Information
دوهفته نامه با شماره پیاپی سال 2005
Pages
5
From page
6529
To page
6533
Abstract
The increasing demands for indium in recent years require high purity indium as raw
materials. Physical-chemical purification and electrorefining have been performed to obtain
6N high purity indium. Indium is smelted by using NaOH, NaCl and NaNO3 for 20 min at
400◦C, the removing rate of Sn, Zn, Al reaches 40, 60 and 37% respectively. The removing
rate of Cd is 90–95% and that of Tl reaches 40–60% when indium is smelted for 10 min by
20% glycerin solution of KI and I2 at 180◦C. When indium metal is vacuum refined in two
stages: 800–900◦C for 2 h and 950–1050◦C for 2 h, the major impurity elements, Pb, Zn, and
Bi, are effectively removed. When indium is electrolytic refined in In2(SO4)3-H2SO4 system,
in which indium content is 60–80 g/L, pH 2.0–3.0, current density 50–80 A/m2, the content of
impurities can be dropped and the product of indium reaches 99.9999%.
C 2005 Springer Science + Business Media, Inc.
Journal title
Journal of Materials Science
Serial Year
2005
Journal title
Journal of Materials Science
Record number
830474
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