Title of article
Interface characteristics in diffusion bonding of a c-TiAl alloy to Ti–6Al–4V
Author/Authors
XiuFeng Wang، نويسنده , , Mo Ma، نويسنده , , XueBin Liu، نويسنده , , Jianguo Lin، نويسنده ,
Issue Information
دوهفته نامه با شماره پیاپی سال 2007
Pages
5
From page
4004
To page
4008
Abstract
In the present study, diffusion bonding of a
c-TiAl alloy to a Ti–6Al–4V alloy at the different
temperatures ranging from 1073 to 1173 K under an
applied stress of 100 MPa for 2 h was investigated. The
observation of the microstructure revealed that sound
joints between the c-TiAl Alloy and the Ti-alloy
without any pores or cracks could be achieved through
diffusion bonding at temperatures over 1073 K under
the applied stress of 100 MPa for 2 h. The bond was
composed of two zones, and its width increases with
the increase of the bonding temperature. The EDS
chemical composition profiles indicated that there is a
diffusion flux of Al-atoms from c-TiAl alloy towards
the Ti-alloy and of Ti-atoms in the opposite direction.
The microhardness of the diffusion bond was in the
range of 310–450 HV, and increased monotonously
from the side near the c-TiAl alloy to the side near the
Ti-alloy. In this bonding process, the diffusion flux of
Ti atoms in interface is mainly controlled by grain
boundary diffusion
Journal title
Journal of Materials Science
Serial Year
2007
Journal title
Journal of Materials Science
Record number
832869
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