• Title of article

    Interface characteristics in diffusion bonding of a c-TiAl alloy to Ti–6Al–4V

  • Author/Authors

    XiuFeng Wang، نويسنده , , Mo Ma، نويسنده , , XueBin Liu، نويسنده , , Jianguo Lin، نويسنده ,

  • Issue Information
    دوهفته نامه با شماره پیاپی سال 2007
  • Pages
    5
  • From page
    4004
  • To page
    4008
  • Abstract
    In the present study, diffusion bonding of a c-TiAl alloy to a Ti–6Al–4V alloy at the different temperatures ranging from 1073 to 1173 K under an applied stress of 100 MPa for 2 h was investigated. The observation of the microstructure revealed that sound joints between the c-TiAl Alloy and the Ti-alloy without any pores or cracks could be achieved through diffusion bonding at temperatures over 1073 K under the applied stress of 100 MPa for 2 h. The bond was composed of two zones, and its width increases with the increase of the bonding temperature. The EDS chemical composition profiles indicated that there is a diffusion flux of Al-atoms from c-TiAl alloy towards the Ti-alloy and of Ti-atoms in the opposite direction. The microhardness of the diffusion bond was in the range of 310–450 HV, and increased monotonously from the side near the c-TiAl alloy to the side near the Ti-alloy. In this bonding process, the diffusion flux of Ti atoms in interface is mainly controlled by grain boundary diffusion
  • Journal title
    Journal of Materials Science
  • Serial Year
    2007
  • Journal title
    Journal of Materials Science
  • Record number

    832869