Sol–gel processing and UVA patterning of epoxy-based hybrid organic–inorganic thin films

Sol–gel processed photosensitive hybrid organic–inorganic films, deposited from 2-(3,4-epoxycyclohexylethyltrimethoxysilane) (EETMOS), have been studied. EETMOS sols have been optimized with respect to several criteria that guarantee a good quality, photosensitivity, and reproducibility of derived films. Photo-sensitivity of EETMOS-based films has been assessed by UVA exposure experiments. Optimized films have been photopatterned using a mercury lamp or a He–Cd laser source, both emitting in theUVAspectral range. Promising micronic size motives have been laser patterned. The quality of derived motives is discussed with respect to photopolymerization mechanisms and photo-patterning parameters.