• Title of article

    Ellipsometric studies of the oxidation kinetics of Cu particles supported on oxidised Si(100)

  • Author/Authors

    R. van Wijk، نويسنده , , O.L.J. Gijzeman، نويسنده , , J.W. Geus، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 1996
  • Pages
    9
  • From page
    237
  • To page
    245
  • Abstract
    The oxidation of Cu particles supported on oxidised Si(100) by molecular oxygen was investigated by means of ellipsometry and Auger electron spectroscopy. The oxidation between 373 and 673 K of three different particle sizes was investigated: 4, 5 and 15 nm particles respectively. The δΔ curves of oxidation were divided into a part corresponding to surface oxidation, oxidation of the particles from Cu to Cu2O and oxidation from Cu2O to CuO0.67. All measured δΔ curves scaled in the exposure, indicating a first order dependence on the oxygen pressure. The following activation energies for the oxidation from Cu to Cu2O were obtained: Eact = 28 ± 5 kJ/mol for 4 nm, Eact = 30 ± 5 kJ/mol for 5 nm and Eact = 25 ± 5 kJ/mol for 15 nm particles. For the oxidation of Cu2O to CuO0.67: Eact = 38 ± 4 kJ/mol for 4 nm, Eact = 36 ± 4 kJ/mol for 5 nm and Eact = 37 ± 4 kJ/mol for 15 nm particles.
  • Journal title
    Applied Surface Science
  • Serial Year
    1996
  • Journal title
    Applied Surface Science
  • Record number

    990456