• Title of article

    Dynamics of silicon plume generated by laser ablation and its chemical reaction

  • Author/Authors

    T. Makimura، نويسنده , , K. Murakami، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 1996
  • Pages
    9
  • From page
    242
  • To page
    250
  • Abstract
    Chemical reaction of laser-ablated silicon particles with oxygen gas diluted with a helium buffer gas is found by means of soft X-ray absorption spectroscopy. In order to make clear the dynamics of silicon laser plume and the mechanism of the chemical reaction, we measured time-resolved spatial distribution of light emission from the laser-ablated particles as well as time- and space-resolved emission spectra.
  • Journal title
    Applied Surface Science
  • Serial Year
    1996
  • Journal title
    Applied Surface Science
  • Record number

    990581