Title of article
Dynamics of silicon plume generated by laser ablation and its chemical reaction
Author/Authors
T. Makimura، نويسنده , , K. Murakami، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 1996
Pages
9
From page
242
To page
250
Abstract
Chemical reaction of laser-ablated silicon particles with oxygen gas diluted with a helium buffer gas is found by means of soft X-ray absorption spectroscopy. In order to make clear the dynamics of silicon laser plume and the mechanism of the chemical reaction, we measured time-resolved spatial distribution of light emission from the laser-ablated particles as well as time- and space-resolved emission spectra.
Journal title
Applied Surface Science
Serial Year
1996
Journal title
Applied Surface Science
Record number
990581
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