Title of article
The role of gas-phase in the laser etching of Cu by CCl4
Author/Authors
D. Débarre، نويسنده , , A. Aliouchouche، نويسنده , , J. Boulmer، نويسنده , , B. Bourguignon، نويسنده , , J.P. Budin، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 1996
Pages
4
From page
453
To page
456
Abstract
In the laser etching of surfaces, the gas-surface chemical reaction used may be spontaneous or induced by a laser-gas interaction. We put into evidence a third mechanism allowing to use gas molecules that interact directly neither with the surface nor with the laser but that contains reactive atoms.
Journal title
Applied Surface Science
Serial Year
1996
Journal title
Applied Surface Science
Record number
990615
Link To Document