• Title of article

    The role of gas-phase in the laser etching of Cu by CCl4

  • Author/Authors

    D. Débarre، نويسنده , , A. Aliouchouche، نويسنده , , J. Boulmer، نويسنده , , B. Bourguignon، نويسنده , , J.P. Budin، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 1996
  • Pages
    4
  • From page
    453
  • To page
    456
  • Abstract
    In the laser etching of surfaces, the gas-surface chemical reaction used may be spontaneous or induced by a laser-gas interaction. We put into evidence a third mechanism allowing to use gas molecules that interact directly neither with the surface nor with the laser but that contains reactive atoms.
  • Journal title
    Applied Surface Science
  • Serial Year
    1996
  • Journal title
    Applied Surface Science
  • Record number

    990615