Title of article
Excimer laser ablation and film deposition of Ti:sapphire
Author/Authors
P.E. Dyer، نويسنده , , S.R. Jackson، نويسنده , , P.H. Key، نويسنده , , W.J. Metheringham، نويسنده , , M.J.J. Schmidt، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 1996
Pages
6
From page
849
To page
854
Abstract
ArF laser ablation of Ti:sapphire (Ti:Al2O3) has been investigated as a potential means for micromachining this laser crystal and depositing thin layers for use as active waveguides. Plume spectra recorded for ablation in low pressure oxygen and a preliminary assessment of layers grown by this method are reported.
Journal title
Applied Surface Science
Serial Year
1996
Journal title
Applied Surface Science
Record number
990688
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