• Title of article

    The surface and interface reaction of metal thin film on sapphire substrate

  • Author/Authors

    H.J. Kang، نويسنده , , C.H. Kim، نويسنده , , N.S Park، نويسنده , , M.W. Kim، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 1996
  • Pages
    5
  • From page
    160
  • To page
    164
  • Abstract
    The microscopic properties of the surface and interface reaction between active metals such as Ti, Zr and sapphire substrate have been studied using X-ray photoelectron spectroscopy (XPS). XPS results indicate that the submonolayer of titanium does not react with oxygen into sapphire at room temperature, but at about 1073 K titanium reduces the sapphire with the formation of TiO2 and metallic Al at the interface. But in the case of Zr, there is no tendency of any reaction at the interface with sapphire substrate even at high temperature. The result shows that Ti reacts more actively with sapphire than Zr does.
  • Journal title
    Applied Surface Science
  • Serial Year
    1996
  • Journal title
    Applied Surface Science
  • Record number

    990779