Title of article
Effect of chemical preoxidation treatment on the structure of SiO2Si interfaces
Author/Authors
Hiroshi Nohira، نويسنده , , Hiroaki Sekikawa، نويسنده , , Masanori Matsuda، نويسنده , , Takeo Hattori، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 1996
Pages
5
From page
359
To page
363
Abstract
The effects of chemical preoxidation treatments on the oxidation reaction at SiO2Si(111) interfaces were investigated using XPS. In the case of preoxidation treatment in a mixed solution of H2SO4 and H2O2 the layer-by-layer oxidation reaction occurs at the interface as in the case of the preoxidation treatment in dry oxygen at 300°C. The effect of chemical preoxidation treatment in a hot solution of HNO3 and that in a mixed solution of HCl and H2O2 on the oxidation reaction at the interface were also investigated.
Journal title
Applied Surface Science
Serial Year
1996
Journal title
Applied Surface Science
Record number
991083
Link To Document