• Title of article

    X-ray diffraction patterns of C60 films by the thin film method and the intercalation of O2

  • Author/Authors

    Takashi Itoh، نويسنده , , Shoji Nitta، نويسنده , , Shuichi Nonomura، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 1997
  • Pages
    4
  • From page
    282
  • To page
    285
  • Abstract
    The intercalation and the evolution of O2 in C60 films and the relation to the crystallinity are studied by the X-ray diffraction and gas effusion spectra. It is confirmed by the results of the X-ray diffraction that C60 films prepared on Corning 7059 glass, c-Si, sapphire and mica are crystallized. The X-ray diffraction patterns of C60 films obtained by the thin film method are clearer than those obtained by the conventional θ-2θ method. Two evolution peaks of O2 are found around 80°C and 170°C in gas effusion spectra for C60 films on Corning 7059 glass substrates exposed to air for about 5 days at room temperature. The intercalation and the evolution of O2 in C60 films and the relation to the crystallinity are discussed.
  • Journal title
    Applied Surface Science
  • Serial Year
    1997
  • Journal title
    Applied Surface Science
  • Record number

    991592