Title of article
X-ray diffraction patterns of C60 films by the thin film method and the intercalation of O2
Author/Authors
Takashi Itoh، نويسنده , , Shoji Nitta، نويسنده , , Shuichi Nonomura، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 1997
Pages
4
From page
282
To page
285
Abstract
The intercalation and the evolution of O2 in C60 films and the relation to the crystallinity are studied by the X-ray diffraction and gas effusion spectra. It is confirmed by the results of the X-ray diffraction that C60 films prepared on Corning 7059 glass, c-Si, sapphire and mica are crystallized. The X-ray diffraction patterns of C60 films obtained by the thin film method are clearer than those obtained by the conventional θ-2θ method. Two evolution peaks of O2 are found around 80°C and 170°C in gas effusion spectra for C60 films on Corning 7059 glass substrates exposed to air for about 5 days at room temperature. The intercalation and the evolution of O2 in C60 films and the relation to the crystallinity are discussed.
Journal title
Applied Surface Science
Serial Year
1997
Journal title
Applied Surface Science
Record number
991592
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