Title of article
Single-layer halftone phase-shifting masks for DUV microlithography: optical property simulation and chromium compound film preparation
Author/Authors
Zhong-Tao Jiang، نويسنده , , Seungbum Hong، نويسنده , , Eunah Kim، نويسنده , , Byeong-Soo Bae، نويسنده , , Sungchul Lim، نويسنده , , Sang-Gyun Woo، نويسنده , , Young-Bum Koh، نويسنده , , Kwangsoo No، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 1997
Pages
5
From page
680
To page
684
Abstract
The investigation of single layer halftone phase shift mask (SLHTPSM) has been carried by both simulation and chromium fluoride film fabrication. Theoretical analysis provides the optimum SLHTPSM constructions for I-line (365 nm), KrF (248 nm) and ArF (193 nm) microlithographies. A fully characterization of chromium fluoride film processed by de magnetron sputtering shows a feasibility of using this film in the fabricating DUV-PSM.
Journal title
Applied Surface Science
Serial Year
1997
Journal title
Applied Surface Science
Record number
991618
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