Title of article
Field emission from silicon including continuum energy and surface quantization
Author/Authors
Qing-An Huang، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 1997
Pages
8
From page
229
To page
236
Abstract
The quantum well in the surface of silicon arises from band bending which confines electrons to a narrow surface region during field emission. Based on the Wentzel-Kramer-Brillouin (WKB) approximation, a theory is presented for field emission from both the bulk with the continuum energy and the potential well with the quantized energy. The theory shows no exponential rise in emission current as the field increases at higher fields. The estimated emission current is also higher than that predicted by the classical theory.
Keywords
Quantum well , Field emission , Silicon
Journal title
Applied Surface Science
Serial Year
1997
Journal title
Applied Surface Science
Record number
991927
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