The deposition of TiO2 thin films on self-assembly monolayers studied by X-ray photoelectron spectroscopy

The deposition of TiO2 films on silanized industrial glass surfaces was investigated by XPS. The results show that mercaptopropyltrimethoxysilane was self-assembled on the industrial glass surface and the terminal groups (-SH) were nearer to the air/silane interface than the silicon atoms. Longer treatment of SAMs with hydrogen peroxide in acetic acid can make the conversion of the terminal groups in the top-most layer into desirable sulfonate groups complete. TiO2 thin films are successfully absorbed on self-assembly monolayers and titanium oxide with different oxidation states may exist in the thin films as-deposited on the surface of the self-assembly monolayers.