• Title of article

    Reactivity of O with Si 111/surfaces with different surface 2 structures

  • Author/Authors

    K. Shimada، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 1998
  • Pages
    6
  • From page
    170
  • To page
    175
  • Abstract
    Reactivity of O2 with Si 111. surfaces in which both 7=7 dimer–adatom-stacking fault DAS. domains and unreconstructed ‘1=1’ region coexist, have been investigated. The change in surface morphology due to O2 exposure has been monitored in-situ with high temperature STM. The acquired sequential images clearly show that the change due to oxidation preferentially takes place at such sites as ‘1=1’ region, 7=7–‘1=1’ phase boundary and the missing adatom sites in a 7=7 domain, where adatoms have a space to displace upon oxidation. q1998 Elsevier Science B.V. All rights reserved.
  • Keywords
    High temperature STM , Preferential reaction , Si 111. , Dimer–adatom-stacking fault , Oxygen , Structure dependence
  • Journal title
    Applied Surface Science
  • Serial Year
    1998
  • Journal title
    Applied Surface Science
  • Record number

    992596