Title of article
Reactivity of O with Si 111/surfaces with different surface 2 structures
Author/Authors
K. Shimada، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 1998
Pages
6
From page
170
To page
175
Abstract
Reactivity of O2 with Si 111. surfaces in which both 7=7 dimer–adatom-stacking fault DAS. domains and
unreconstructed ‘1=1’ region coexist, have been investigated. The change in surface morphology due to O2 exposure has
been monitored in-situ with high temperature STM. The acquired sequential images clearly show that the change due to
oxidation preferentially takes place at such sites as ‘1=1’ region, 7=7–‘1=1’ phase boundary and the missing adatom
sites in a 7=7 domain, where adatoms have a space to displace upon oxidation. q1998 Elsevier Science B.V. All rights
reserved.
Keywords
High temperature STM , Preferential reaction , Si 111. , Dimer–adatom-stacking fault , Oxygen , Structure dependence
Journal title
Applied Surface Science
Serial Year
1998
Journal title
Applied Surface Science
Record number
992596
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