Title of article
Secondary ion emission from polymer surfaces under Ar+, Xe+ and SF5+ ion bombardment
Author/Authors
F K?tter، نويسنده , , A Benninghoven، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 1998
Pages
11
From page
47
To page
57
Abstract
We investigated the characteristic molecular secondary ion emission from polymer surfaces under 10 keV Ar+, Xe+ and SF+5 bombardment. Secondary ion yields of PET, PP, PTFE, PS, PC, PMMA and PEG were determined under static SIMS conditions. Damage cross sections were measured for PS and PC. We applied a time-of-flight mass spectrometer, equipped with a pulsed EI-source allowing the application of mass separated primary ion beams. Spin coated multilayers as well as surfaces of bulk polymers have been studied. Changing from Ar+ to Xe+ and to SF+5 bombardment we found a strong increase of the yield Y (up to a factor of 1000) and a much smaller increase in the corresponding damage cross sections σ (up to a factor of 6) for characteristic molecular secondary ions. Both effects are more pronounced in the high mass range. The corresponding increases in secondary ion formation efficiencies ranges between a factor of 5 and 50, depending on the polymer species, the sample preparation and the mass range. Preliminary results for monomolecular overlayers on Ag and Si indicate a similar behaviour of their characteristic secondary ion emission.
Keywords
Surface mass spectrometry , Surface analysis , Polymers , SIMS
Journal title
Applied Surface Science
Serial Year
1998
Journal title
Applied Surface Science
Record number
992730
Link To Document